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filingDate 2001-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a01dca1576a4084f8c800a556c0e76cb
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publicationDate 2003-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-1345848-A2
titleOfInvention Composition comprising an oxidizing and complexing compound
abstract The present invention is related to a composition comprising an oxidizing compound and a complexing compound with the chemical formula wherein R1, R2, R3 and R4 are selected from the group consisting of H and any organic side chain. The oxidizing compound can be in the form of an aqueous solution. The complexing compound is for complexing metal ions. Metal ions can be present in the solution or in an external medium being contacted with the solution. The present invention can be used for cleaning a semiconductor substrate
priorityDate 2000-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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