| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f7817b2573160dc2388c37d980f776b6 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B57-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-042 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B57-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2001-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ba9861d504365a8014adc2b350f05715
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6eb210379dd1d470818c9a7f57a93170 |
| publicationDate |
2003-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1339529-A1 |
| titleOfInvention |
Methods, apparatus and slurries for chemical mechanical planarization |
| abstract |
Methods and apparatus (10) for chemical mechanical planarization of an article (25) such as a semiconductor wafer use polishing slurries including a carbon dioxide solvent or a carbon dioxide-philic composition. A carbon dioxide cleaning solvent step and apparatus may also (10) be employed. |
| priorityDate |
2000-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |