| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_069a92549123806a5d654dc036a676e9 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-01019
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-20228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-2816
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-2806
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-2007
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-24564
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-2002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-12032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-0216
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-48227
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-204
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-202
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-3025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-10253
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-01067
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-2813
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-2817
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-01078
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-01025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-01057 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-073
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N23-2251
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-222
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-185
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N23-225 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N23-225
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-073
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01Q30-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-28 |
| filingDate |
2001-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cf18a6ab5311f5fd215f34b6c2143886
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f987da517db545fcc5ec67efdf268d79
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86056225dc4c30672104f49664b4bed1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3c89059aadb7f972db8acb81e45567d9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6f9318ed995a48f5baf8e3d78b752556
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_866fe99d3c7d10788b7ce098d601c1b5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf13b53d1d63d519fa3bdbcd284c76fa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_16f05ee62667b5b31cd8e0c286d62aaa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e67d0a81c1e378e9a21a3840d080848f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_202cadaeddde05297674b5fc391f52e5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a64340d139811583a8b6fc56642f14fb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ac7f66f3c1d09fff77ae785c13fc8764 |
| publicationDate |
2003-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1339100-A1 |
| titleOfInvention |
Inspection method and apparatus using electron beam, and device production method using it |
| abstract |
A substrate inspection apparatus 1-1 (Fig. 1) of thenpresent invention performs the following steps of: carryingna substrate "S" to be inspected into an inspection chambern23-1; maintaining a vacuum in said inspection chamber;nisolating said inspection chamber from a vibration; movingnsuccessively said substrate by means of a stage 26-1 withnat least one degree of freedom; irradiating an electronnbeam having a specified width; helping said electron beamnreach to a surface of said substrate via a primary electronnoptical system 10-1; trapping secondary electrons emittednfrom said substrate via a secondary electron optical systemn20-1 and guiding it to a detecting system 35-1; forming ansecondary electron image in an image processing systemnbased on a detection signal of a secondary electron beamnobtained by said detecting system; detecting a defectivenlocation in said substrate based on the secondary electronnimage formed by said image processing system; indicatingnand/or storing said defective location in said substrate bynCPU 37-1; and taking said completely inspected substratenout of the inspection chamber. Thereby, the defectninspection on the substrate can be performed successivelynwith high level of accuracy and efficiency as well as withnhigher throughput. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3065161-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10217599-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11158484-B2 |
| priorityDate |
2000-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |