Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_00cc418986b8b4c2012a4b5a283fed61 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-005 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00585 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00547 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00502 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C40B70-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00596 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y25-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D1-006 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N33-54346 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D1-00 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C40B70-00 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-00 |
filingDate |
2001-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5374c4f24d1fe030c24c19f0999ccf02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a2a82d9aad578024d7de1fcf623ee871 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d396248c545740ec0e5c94b6d20b376 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_115a58cf5152584e11be179463ece0dd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cac000f1cc5fb05738d68f2a276aa267 |
publicationDate |
2004-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-1337694-A4 |
titleOfInvention |
METHOD FOR PRODUCING COLLOIDAL ROD PARTICLES AS NANOBARCODES |
abstract |
A method is disclosed for the manufacture of colloidal rod particles as nanobarcodes. Figure 3 shows an embodiment of the invention using a four-layer stack on a silicon wafer substrate (101). the substrate (101) is overlaid with conductive layer (102), polymeric layer (103), etch stop layer (104) and photoresist layer (105). Pores (106) are fomed following exposure and development of the photoresist and etching down to the etch stop layer. Pores (107) are fomred by a further etching down through polymer layer (103). Nanoparticles (108) are formed within pores (107) by electrochemical deposition using the conductive layer (102) as the plating electrode. The free-standing nanoparticles (109) are formed by subsequent dissolving of conductive layer (102) forming the nanobarcodes. |
priorityDate |
2000-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |