| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
| filingDate |
2002-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee60aab083183deea75acacb499643dd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9224a4dc3a940fa61ac08c689804ad33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_81008310740b65b0664f16cdbf60384c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8bd67dab0394ff4c64c379e250b22fe7 |
| publicationDate |
2004-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1324134-A3 |
| titleOfInvention |
Resist composition and patterning process |
| abstract |
A resist composition comprising (A) a substantiallynalkali-insoluble polymer having acidic functional groupsnprotected with acid labile groups, which becomes alkalinsoluble upon elimination of the acid labile groups, (B) anphotoacid generator, and (C) a nonionic fluorinatednorganosiloxane compound consisting of perfluoroalkyl-containingnsiloxane bonds and polyoxyethylene type polyethernbonds is exposed to UV having a wavelength of at least 150nnm and developed with an alkaline solution to form a patternnwithout leaving scum. |
| priorityDate |
2001-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |