Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6fc8bbba7dbfdc1fe42f350fc84e17a3 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-422 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-26 |
filingDate |
2002-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e28ac87032c488273ba01ae7582ec73a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f7f21d267191cc69f71d118e221ef9f2 |
publicationDate |
2003-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-1318432-A1 |
titleOfInvention |
Photoresist residue removing liquid composition |
abstract |
The object of the present invention is to provide, innthe production of semiconductor circuit elements, anphotoresist residue removing liquid composition which isnexcellent for removing photoresist residues after drynetching without attacking the wiring material or theninterlayer insulating film etc. n This is made possible by a photoresist residuenremoving liquid composition containing one or more membersnselected from the group consisting of reducing compoundsnand their salts and one or more members selected from thengroup consisting of aliphatic polycarboxylic acids andntheir salts. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007074990-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7858572-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1602714-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101226533-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7563754-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I407489-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1612611-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8772214-B2 |
priorityDate |
2001-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |