| abstract |
The following resist composition which is excellentnparticularly in transparency to light beams and drynetching properties and gives a resist pattern excellentnin sensitivity, resolution, evenness, heat resistance,netc., as a chemical amplification type resist, isnpresented. n A resist composition which comprises a fluoropolymern(A) having repeating units represented by a structurenformed by the cyclopolymerization of one molecule of anfluorinated diene and one molecule of a monoene, in whichnthe monoene unit in each repeating unit has a blockednacid group capable of regenerating the acid group by thenaction of an acid, an acid-generating compound (B) whichngenerates an acid upon irradiation with light, and annorganic solvent (C). |