http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1295176-A2

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-30
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-30
filingDate 2001-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6609cabb439f85d94359f965186cdb7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_623ba4520752fbc2d54919d6cb72301c
publicationDate 2003-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-1295176-A2
titleOfInvention Transmission and phase balance for phase-shifting mask
abstract The present invention comprises a phase-shifting mask and a process for fabricating such a phase-shifting mask. The phase-shifting mask has trenches with vertical sidewall profiles which are retrogade. The retrogade profiles balance the transmission and phase of the light transmitted through the phase-shifted openings relative to the non-phase-shifted openings. The retrograde profile may be formed from an isotropic plasma etch.
priorityDate 2000-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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