| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2002-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_73f447e427e142b0614cd9ae99816738
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e4900f5107982c3eaa801f05ac37a016
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_853861c0b322e06c4a82d380374b3c87 |
| publicationDate |
2003-01-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1273974-A2 |
| titleOfInvention |
Method for reducing a pattern dimension in a photoresist layer |
| abstract |
The invention discloses improvements in the so-calledncoated thermal flow process for reducing the pattern dimensionnof a patterned resist layer on a substrate to accomplishnincreased fineness of resist patterning, in which a coatingnlayer of a water-soluble resin formed on the patterned resistnlayer is heat-treated to effect thermal shrinkage of thencoating layer with simultaneous reduction of the patternndimension followed by removal of the coating layer by washingnwith water. The improvement of the process is obtained bynusing an aqueous coating solution admixed with a water-solublenamine compound such as triethanolamine in addition to anwater-soluble resin such as a polyacrylic acid-based polymer.nFurther improvements can be obtained by selecting the water-solublenresin from specific copolymers including copolymersnof (meth)acrylic acid and a nitrogen-containing monomer suchnas N-vinylpyrrolidone, N-vinylimidazolidinone and N-acryl-oylmorpholinenas well as copolymers of N-vinylpyrrolidone andnN-vinylimidazolidinone in a specified copolymerization ratio. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8563228-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7335464-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8575032-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9653315-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2412004-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2412004-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1757988-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7316885-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10096483-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8629048-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004074941-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9761457-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004051372-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-1752846-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1602983-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1602983-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1653287-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1653287-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10151981-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010110987-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8703570-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9177794-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8796155-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7550248-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004051372-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9330934-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10607844-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8603884-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8852851-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11335563-B2 |
| priorityDate |
2001-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |