| abstract |
Organofluorosilicate glass films contain both organic species and inorganicnfluorines, exclusive of significant amounts of fluorocarbon species. Preferred films arenrepresented by the formula Si v O w C x H y F z , where v+w+x+y+z = 100%, v is from 10 to 35natomic%, w is from 10 to 65 atomic% y is from 10 to 50 atomic%, x is from 1 to 30natomic%, z is from 0.1 to 15 atomic%, and x/z is optionally greater than 0.25, whereinnsubstantially none of the fluorine is bonded to the carbon. A CVD method includes: (a)nproviding a substrate within a vacuum chamber; (b) introducing into the vacuum chamberngaseous reagents including a fluorine-providing gas, an oxygen-providing gas and atnleast one precursor gas selected from an organosilane and an organosiloxane; and (c)napplying energy to the gaseous reagents in the chamber to induce reaction of thengaseous reagents and to form the film on the substrate. |