| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_81cfb88d909c75104c0c8d61799a72b0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-0446
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2257-706
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2259-40096
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2256-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2259-40098
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2258-0216
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2253-108
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2253-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2253-104
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2253-102 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-18 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-64
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| filingDate |
2000-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef00b894042cc0b574c521d443c6e9a6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f6a72457d6177eb5e294ead799c9238
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e4441645069dfb6983895685156f30a2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1651255ce2e85b37e7538a7dc17b7736
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_728c77721e1a707b77c4cce75dbe14b9 |
| publicationDate |
2002-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1237815-A1 |
| titleOfInvention |
Abatement of effluents from chemical vapor deposition processes using organometallicsource reagents |
| abstract |
A method and apparatus for abatement of effluent from a CVD process using a source reagent having a metal organic loosely bound to an organic or organometallic molecule such that upon exposure to heat (36) such bond is readily cleavable, e.g., copper deposition process involving the formation of films on a substrate (32) by metalorganic chemical vapor deposition (CVD) utilizing a precursor composition (16) for such film formation. The abatement process in specific embodiments facilitates high efficiency abatement of effluents from copper deposition processes utilizing Cu(hfac)TMVS as a copper source reagent (14). |
| priorityDate |
1999-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |