http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1199740-A2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_948d7b039296a69d678c8423c95ca22f |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67057 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67034 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate | 1996-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_10a48b94c412f5233584359360d54375 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0ef83fb6a3144ff25c2e4a094b2b1fe4 |
| publicationDate | 2002-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-1199740-A2 |
| titleOfInvention | Procedure for drying silicon |
| abstract | A method of drying a substrate surface (1), comprising: dipping the substrate into a liquid bath (2); separating the substrate from the liquid bath (2), whereby the liquid of the liquid bath (2) comprises an aqueous HF solution (3), the substrate surface being hydrophobic upon separation from the liquid bath, the substrate being separated from the bath at a rate that permits the bath liquid to drain from the hydrophobic surface of the substrate to produce a dry substrate; and that a gas comprising an O2/O3 mixture that forms a hydrophilic surface on the substrate is directed over the surface of the substrate (1) after separating the substrate (1) from the liquid bath. <IMAGE> |
| priorityDate | 1995-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 44.