| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ffe07c4a9253618350e6db4ac80abec5 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-145
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0076 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-023 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41C1-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
| filingDate |
2001-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_399db3e6a957c27d62eb3ffc2fcbfd5d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ced01e09f0b19822e58362879d72e49f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_49f2bdd4fb93e4944ede7494770a303a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_577a93e7ecee4d96bdebdb4dc14042b6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_74c3ecd99a226ac55a7483b278c85607 |
| publicationDate |
2002-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1186955-A2 |
| titleOfInvention |
Masks and mask precursors, electronic part precursors and electronic parts |
| abstract |
Imagable precursors for masks and for electronic partsncomprise a polymeric layer applied to a substrate. Thenlayer comprises at least one polymer having infra-rednabsorbing groups carried as pendent groups on the polymernbackbone. Certain infra-red absorbing groups may also actnto insolubilize the polymer in a developer, until it isnimagewise exposed to infra-red radiation. Imagewisenapplication of heat, resulting from imagewise exposure ofnthe precursor to infra-red radiation, renders the polymernlayer more soluble in the developer than prior to exposurento the infra-red radiation. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101247655-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-1954007-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-02082180-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1379918-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1379918-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1297950-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006050937-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2054454-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8632947-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/AU-2005303956-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2054454-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7041427-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1655317-A1 |
| priorityDate |
2000-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |