| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36f8253f3d0d59bcd9259217d4385d10 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 |
| filingDate |
2001-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30a413dbea490e25e321707ef9b29a17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b3fa5d1b3562e8d347e35469e0eee447
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8dc90fa8e8aebb0c9b3406d76c13b1a4 |
| publicationDate |
2002-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1176634-A2 |
| titleOfInvention |
Method of anisotropic dry etching organic antireflection layers |
| abstract |
In a process for the anisotropic dry etching of an organic anti-reflection layer, essentially hydrogen and nitrogen are used as etching gases. |
| priorityDate |
2000-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |