| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cef1f43aa7ea51e6a592082d9f2a3103 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3121
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31633
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31695
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02203
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02343
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 |
| filingDate |
2001-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fe9421d81fa887cee037f4e3588b3ec7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01cc9a790f2804f0b7bc9f6cceb0c191
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c708f1b8ffd01a4375700adf2d9bf84d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f2b6c7216a82af844332c77a58c64cd1 |
| publicationDate |
2002-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1172847-A2 |
| titleOfInvention |
A method to produce a porous oxygen-silicon layer |
| abstract |
The present invention concerns a method tonproduce a porous oxygen-silicon insulating layer comprisingnfollowing steps:n applying a silicon oxygen layer to a substrate exposing the said substrate to a HF ambient. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1795627-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1464726-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1464726-A3 |
| priorityDate |
2000-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |