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filingDate 2000-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2001-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-1163488-A1
titleOfInvention Method and apparatus for wafer metrology
abstract This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.
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