Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cf065fc014dfde09786fec35e300e673 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-211 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-12 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B49-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01B11-0625 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-9501 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01B11-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-21 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B49-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01B11-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01B11-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01B11-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-95 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
filingDate |
2000-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b71f85feb4f6a14f095929e5458bde34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_73f2eb56844d224fa58a2eb1ed81cf5f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_29989dc68639ec5508852c831f73b1a3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cb423caab50ef0ffc719322983c1581f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e98f36540207324e7d1f28e874c9f10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4293b2cfd65b2f7ed4d17f81c96bc788 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6f7d5bac0aeb2db005aa1fad62f0b01 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3130c6cc095c06885d95a560511c3a0d |
publicationDate |
2001-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-1163488-A1 |
titleOfInvention |
Method and apparatus for wafer metrology |
abstract |
This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other. |
priorityDate |
1999-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |