http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1128212-A2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2001-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9b0528a8ae6ad84bf0d1255548c1110 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47dfc59ffde831488f20bdcd86fb640a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b36d5bfe2e6c486590f546177af97b6 |
| publicationDate | 2001-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-1128212-A2 |
| titleOfInvention | Chemically amplified positive resist composition |
| abstract | A chemically amplified positive resist compositionnexcellent in adhesion to a substrate, as well as good inndry-etching resistance; nsuitable for use in excimer laser lithography utilizing ArF,nKrF or the like; and ncomprising n a resin (X) which, per se, is insoluble in alkali butnbecomes soluble in alkali when subjected to an action of acid,nand has a polymeric unit represented by the formula(I), anpolymeric unit represented by the formula(II) and a polymericnunit represented by the formula(III):n n wherein R 1 and R 3 each independently represent hydrogennor methyl, R 2 represents alkyl, R 4 represents hydrogennor hydroxyl, and R 5 and R 6 each independently representnhydrogen, alkyl having 1 to 3 carbon atoms, hydroxyalkylnhaving 1 to 3 carbon atoms, carboxyl, cyano or a groupnrepresented by -COOR 7 , wherein R 7 represents an alcoholnresidue, or R 5 and R 6 together form a carboxylic acid nanhydride residue represented by -C(=O)OC(=O)-, and anpolymeric unit derived from unsaturated dicarboxylic acidnanhydride selected from maleic anhydride and itaconicnanhydride; and nan acid generating agent (Y). |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1128213-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1128213-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6503687-B2 |
| priorityDate | 2000-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 342.