| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31663 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 |
| filingDate |
2001-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_707b65ed537e0dcdcd0ac90952ad93d5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cb4f5f15202be83058755c8af33ee9e8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c78cd8ad7fc933c22e136fd9add2b048 |
| publicationDate |
2002-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1127929-A3 |
| titleOfInvention |
Composition for film formation, method of film formation, and silica-based film |
| abstract |
A composition for film formation which is capable ofngiving a silica-based coating film having an exceeding lowndielectric constant and improved mechanical strength and usefulnas an interlayer insulating film in semiconductor devices andnthe like, a process for producing the composition, and ansilica-based film obtained from the composition. Thencomposition comprises (A) a product of hydrolysis andncondensation obtained by hydrolyzing and condensing one or morensilane compounds, and (B) an organic solvent. |
| priorityDate |
2000-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |