http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1108731-A2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7f9af914ed2fb00cd4f1b8b1a28964e4 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L2201-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L2201-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-40 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-49 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F222-40 |
| filingDate | 2000-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f675640a5aabfa043a0a26a6d30abe30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5209bf1dda71e230931a8ea4a0dad59 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_19b0cbf2e216c319069a076462317881 |
| publicationDate | 2001-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-1108731-A2 |
| titleOfInvention | Transparent heat-resistant resin and production process therefor |
| abstract | The present invention provides: a transparent heat-resistant resinnthat has a small amount of both the residual maleimide monomer andnthe maleimide monomer generated by heating in order to carry out suchnas a mold processing, and further, is excellent in heat resistance andnyellowish little; a production process therefor; and a resin compositionnutilizing this resin. The transparent heat-resistant resin, according to thenpresent invention, is obtained by a process including the step of runningna polymerization of comonomers including a maleimide monomer and anmethacrylic acid ester monomer, wherein the amount of the residualnmaleimide monomer in the resin is not more than 10X ppm when thenamount of a structural unit derived from the maleimide monomer is Xnweight % in the resin, and the amount of the generated maleimidenmonomer by heating the resin at 240 °C for 10 minutes is not more thann10X ppm when the amount of a structural unit derived from thenmaleimide monomer is X weight % in the resin. In addition, thenproduction process for a transparent heat-resistant resin, according to thenpresent invention, comprises the step of running a polymerization ofncomonomers including a maleimide monomer and a methacrylic acidnester monomer in order to obtain a transparent resin having heatnresistance, wherein an acidic substance is made to exist with a sulfurnchain-transfer agent in the polymerization system during thenpolymerization. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10597524-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108350125-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108350125-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7456239-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1573150-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3835331-A4 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2910397-B1 |
| priorityDate | 1999-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 701.