http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1091018-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b051f9f7933c758e66f6ceda5c9fb2cc |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-448 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4402 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-448 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-452 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 |
| filingDate | 2000-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf624c2b00c5089e41db83797da687f1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1e17be37ee9669432054c821707de60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b411fa22f479c905b743250365310bab http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d352978bcd5077268ace6d2b84123ed |
| publicationDate | 2001-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-1091018-A1 |
| titleOfInvention | Purification, analysis and deposition of titanium amides |
| abstract | The present invention is a process for enhancing the chemical vapor depositionnof titanium nitride from a titanium containing precursor selected from the group consistingnof tetrakis(dimethylamino)titanium, tetrakis(diethylamino)titanium and mixtures thereof,nreacted with ammonia to produce the titanium nitride on a semiconductor substrate bynthe addition of organic amines, such as dipropylamine, in a range of approximately 10nparts per million by weight to 10% by weight, preferably 50 parts per million by weight ton1.0 percent by weight, most preferably 100 parts per million by weight to 5000 parts pernmillion by weight to the titanium containing precursor wherein prior to the reaction, saidntitanium containing precursor is subjected to a purification process to removenhydrocarbon impurities from the titanium containing precursor. It is shown that additionnof small amounts of organic amines enhance the deposition rate of titanium nitride, whilenthe presence of hydrocarbons, such as n-decane, retard the deposition rate of titaniumnnitride. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8409983-B2 |
| priorityDate | 1999-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 48.