Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d3082cd39bb800686b9abbb8aa05c80b |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-321 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
filingDate |
1999-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2002-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57499dea4a8015463a78a49f502ecff8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_629804165d4fc3d2c82d4a61e067005a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e45d419b136aaf62edab29ec45ddee1a |
publicationDate |
2002-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-1090083-B1 |
titleOfInvention |
Chemical mechanical polishing slurry useful for copper/tantalum substrates |
priorityDate |
1998-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |