| abstract |
A radiation-sensitive resin composition comprising (A)na resin containing an acid-dissociable group which is insolublenor scarcely soluble in alkali and becomes alkali soluble whennthe acid-dissociable group dissociates, comprising thenfollowing recurring unit (I), recurring unit (II), and at leastnone of the recurring units (III-1) and (III-2), and (B) a photoacidngenerator.n nThe radiation-sensitive resin composition is suitable for usenas a chemically-amplified resist showing sensitivity to activenradiation such as deep ultraviolet rays represented by a KrFnexcimer laser or ArF excimer laser, exhibiting superior drynetching resistance without being affected by types of etchingngas, having high radiation transmittance, exhibiting excellentnbasic characteristics as a resist such as sensitivity, resolution,nand pattern shape, possessing excellent storage stability asna composition, and exhibiting sufficient adhesion to substrates. |