| abstract |
An organic substrate having optically-active layers deposited by magnetron sputtering and a preparation process for it are provided. Gas pressure used for carrying out better adhesion by sputtering is high, comprised between 0.8 and 5.0 Pa. Sputtering is particularly suitable for targets of Si, Ti, Zr and organic substrates with or without anti-abrasive coating. Improved adhesion of thin films is obtained. Use for providing optically-active layers, for example anti-reflective layers, using magnetron sputtering of metallic layers, with subsequent oxidation or treatment in a reactive atmosphere. |