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filingDate 1999-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2005-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_811860dacf88a14a0bd370a5b7d5283c
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publicationDate 2005-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-1070353-B1
titleOfInvention A method for making a wafer-pair having sealed chambers
abstract A method for fabricating a wafer-pair having at least one recess in one wafer and the recess formed into a chamber with the attaching of the other wafer which has a port plugged with a deposited layer on its external surface. The deposition of the layer may be performed in a very low pressure environment, thus assuring the same kind of environment in the sealed chamber. The chamber may enclose at least one device such as a thermoelectric sensor, bolometer, emitter or other kind of device. The wafer-pair typically will have numerous chambers, with devices, respectively, and may be divided into a multiplicity of chips.
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