| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9d91b2f9432de1bcf3290473f7a3e96c |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23G1-061
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02071
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-3942 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23G1-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-39
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate |
1998-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c3134fe3b3455d58d4443e1d09ea2f4b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30acb21d0f4d62372ba2f0b821d837d9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e86dbd66e4a95c201dfda7fcbf8a009 |
| publicationDate |
2001-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1070157-A1 |
| titleOfInvention |
Method for removing photoresist and plasma etch residues |
| abstract |
A method for the removing of plasma etch residues on a substrate comprising the steps of: (i) contacting the substrate with a cleaning composition, and (ii) contacting the substrate with ozonated water. The preferred cleaning composition has a pH from 2 to 6 and comprises: (A) water; (B) at least one selected hydroxylammonium compound; and (C) at least one basic compound; and optionally (D) a chelating stabilizer; and optionally (E) a surfactant. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107589637-A |
| priorityDate |
1998-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |