| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dc05229904be2987713acc8b41db7cd3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 |
| filingDate |
1999-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c723031214dcd4ed6d114cbd249b17c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3a3a2d63fdfe33a81734fc0ec2cc28b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_21671d0a350d84a2ade1ce5c971cc05f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7b615314e4283445004f1cd3a3ceb356
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f716dd1e558ac9bbdcce203912f01004 |
| publicationDate |
2000-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1061562-A1 |
| titleOfInvention |
Method for forming resist pattern |
| abstract |
In a process for manufacturing integrated circuit elementsnor the like by photolithography, a method for reducing detrimentalninfluence on resist shape due to properties of a substrate ornacidity of substrate surface in case where a chemically amplifiednresist or the like is used as a photoresist, and a substrate-treatingnagent composition to be used for this method are described.nThe substrate-treating agent composition comprises a solutionncontaining a salt between at least one basic compound selectednfrom among primary, secondary and tertiary amines andnnitrogen-containing heterocyclic compounds and an organic acidnsuch as a sulfonic acid or a carboxylic acid. This compositionnis coated on a substrate surface having thereon a bottomnanti-reflective coating such as SiON layer, baked and, ifnnecessary washed, then a chemically amplified resist is coatednon the thus-treated substrate, exposed and developed to form anresist pattern on the substrate. |
| priorityDate |
1998-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |