http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1055969-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dc05229904be2987713acc8b41db7cd3 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L79-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate | 1999-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b23477984332981e8442bc643baa37c6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c84b76d2ac4fa9cd50d009e159cc7561 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_177bc310089c4df9e76be6db0cef57b6 |
| publicationDate | 2000-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-1055969-A1 |
| titleOfInvention | Positively photosensitive resin composition |
| abstract | A positive-working radiation-sensitive resin composition showingna good throughput upon production of semiconductors or the like andnless process dependence of dimensional accuracy as well as having highnsensitivity and high resolution, and being able to form a pattern withngood shape and a high aspect ratio. The positive-workingnradiation-sensitive resin composition comprises (i) a radiation-sensitivennovolak resin comprising a reaction product between annalkali-soluble novolak resin from which low-molecular-weightncomponents have been removed by fractional treatment and an o-naphthoquinonediazidencompound, or a product obtained by removingnlow-molecular-weight components by fractional treatment from anreaction product between an alkali-soluble novolak resin and an o-naphthoquinonediazidencompound, and (ii) a low-molecular compoundnrepresented by the general formula (I) and having phenolic hydroxylngroup or groups:n nwherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 and R 7 each represents independently H,na C 1 to C 4 alkyl group, a C 1 to C 4 alkoxyl group, a cyclohexyl group nor a group represented by the formula:n nwherein R 8 represents H, a C 1 to C 4 alkyl group, a C 1 to C 4 alkoxyl groupnor a cyclohexyl group; each of m and n is 0, 1 or 2; each of a, b, c,na, e, f, g and h is 0 or an integer of 1 to 5 satisfying a + b ≦ 5 ,n c + d ≦ 5 , e + f ≦ 5 , and g + h ≦ 5 ; and i is 0, 1 or 2. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004088423-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004088423-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1664928-B1 |
| priorityDate | 1998-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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