| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| filingDate |
1998-11-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_260ebbf314e942639659e8afdb09aef6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d753a17947d9b72fcb09b93904829b5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a3486624d64ee253f983b48b436d68f |
| publicationDate |
2000-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1047808-A1 |
| titleOfInvention |
Method of cleaning a cvd cold-wall chamber and exhaust lines |
| abstract |
A method of cleaning post deposition deposits from a processing chamber by providing a chlorine gas (Cl2), forming chlorine radicals and reacting the chlorine radicals with the deposits. |
| priorityDate |
1998-01-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |