| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f9e18b9bdd5e33541e1ca19e050aa8bf |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-0486 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05C11-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-0486
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-005 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05C11-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05C11-00 |
| filingDate |
1998-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86f6d72b278e7d9b006bdb6df4305400
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_664369a079dc0052e7b31f6e731a208f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d9cc351a1c0ffb96a69b852fabbd6c46 |
| publicationDate |
2000-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1044074-A1 |
| titleOfInvention |
Photoresist coating process control with solent vapor sensor |
| abstract |
An apparatus (2) for spin coating surfaces with liquid polymer comprises a spin coating chamber (6) having a rotatable chuck (4) for supporting an object (5) to be coated. A distributor (12) introduces gases into the chamber. A solvent vapor and carrier gas supply provides a carrier gas having a controlled level of solvent vapor therein within the range of from 0 to saturation concentrations of solvent vapor. A solvent vapor sensor (32) is positioned with respect to the coating chamber to produce signals which correspond to the concentration of solvent vapor in the coating chamber. A control means (20) is connected to the solvent vapor concentration sensor and to the solvent vapor and carrier gas supply means for controlling the level of solvent concentration in the carrier gas supplied by the solvent vapor and carrier gas supply means. |
| priorityDate |
1997-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |