| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d5d04736b0b882a4f5a1e0e0e4cd8cbb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-143
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-26 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-442
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-442
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate |
1998-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_15987f3eecd7e174dad421b840aa03e1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7c3dfca5d464fc6937ddb50af13570d |
| publicationDate |
2000-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1004936-A4 |
| titleOfInvention |
RESIST RESIN, RESIST RESIN COMPOSITION AND THIS METHOD FOR PRODUCING PATTERNS |
| abstract |
A resist resin containing a copolymer having a (meth)acrylic structure having a side chain group decomposable with an acid and a polyorganosilsequioxane structure of general formula (1) in the same molecule, or a mixture of polymers having these structures in different molecules, and a process for patterning with the resist resin wherein the symbols are as defined in the description. This resist resin has a high sensitivity to a radiation having a short wavelength of 220 nm or below and is capable of forming a fine parttern of the order of 0.15 νm or below. |
| priorityDate |
1997-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |