| abstract |
The invention relates to a method for purifying a cryogenic fluid, in particular argon, nitrogen, helium or oxygen, comprising impurities N 2 O, C n H m or NO x , in which one eliminates impurities by contacting the cryogenic fluid to be purified with adsorbent particles having an average size less than or equal to 1.5 mm, preferably from 0.8 mm to 1.1 mm.n n n A purified cryogenic fluid containing less thann100 ppb of impurities, preferably less than 10 ppb of impurities.n n n This process can be used to produce ultra-pure gases intendednespecially in the field of electronics. |