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filingDate 1999-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_271eba1c9604e23cad81b990962c9180
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publicationDate 2000-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0992339-A3
titleOfInvention Puncture resistant polymeric films, blends and process
abstract A polymer blend and mono-and multilayer films made therefrom suitable for processing ornpackaging articles which films have an improved combination of properties e.g. such as lowerntear strength and higher puncture resistance, or higher puncture resistance at both roomntemperature in air and at elevated temperatures in contact with water wherein the blendnpreferably has a first copolymer of ethylene and hexene-1 having a copolymer melting point ofn80 to 98°C, preferably of 80 to 92°C; a second copolymer of ethylene and at least one α-olefinnhaving a copolymer melting point of 115 to 128°C; and a third copolymer of ethylene and anvinyl ester or alkyl acrylate and having a melting point of 60 to 110°C, and a process for makingnsuch films, especially shrink films having at least 40% shrink at 90°C in at least one direction.
priorityDate 1998-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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