| abstract |
The present invention is directed to a non-corrosive photoresist stripping and cleaning composition, comprising: (a) about 5 % to about 50 % solvent selected from the group consisting of N-methyl-2-pyrrolidinone, N-hydroxyethyl-2-pyrrolidinone, 1,3-dimethyl-2-imidazolidinone, dimethylsulfoxide, N,N-dimethylacetamide, diacetone alcohol, ethylene glycol, propylene glycol and admixtures thereof; (b) about 10 % to about 90 % of an alkanolamine selected from the group consisting of diethyleneglycolamine, monoethanolamine, diethanolamine, triethanolamine, 2-(2-aminoethylamino)ethanol, and admixtures thereof; (c) about 0.1 % to about 4 % of Formula (I) where R1-R4 are individually selected from the group consisting of hydrogen, alkyl groups having 1-4 carbon atoms, alkoxy groups having 1-4 carbon atoms, halogen groups, amino groups, hydroxyl groups, carboxyl groups or combinations thereof; and (d) about 0.1 % to about 40 % of water, all percentages by weight of the total stripping and cleaning composition. |