| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
1999-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b36d5bfe2e6c486590f546177af97b6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9b0528a8ae6ad84bf0d1255548c1110
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6ba3d4b81afe3bd34d3a8f0197bfe93b |
| publicationDate |
2000-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0982628-A3 |
| titleOfInvention |
A chemical amplifying type positive resist composition |
| abstract |
A chemical amplifying type positive resist composition,nexcellent in adhesion to a substrate and good in resistnperformances and suitable for exposure using a KrF excimernlaser, ArF excimer laser, or the like, which comprises a resinnhaving a polymerization unit of 2-alkyl-2-adamantyln(meth)acrylate and a polymerization unit of a monomer selectednfrom 3-hydroxy-1-adamantyl (meth)acrylate andn(meth)acrylonitrile, and an acid generator is provided. |
| priorityDate |
1998-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |