| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F3-00 |
| filingDate |
1998-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb9dc22a0661c372e87b8bdc13eee7bb |
| publicationDate |
2000-01-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0969057-A1 |
| titleOfInvention |
Dual-valent rare earth additives to polishing slurries |
| abstract |
A slurry containing abrasive particles and a dual-valent rare earthnion or suspension of its colloidal hydroxide is especially useful fornpolishing surfaces, including those used in microelectronics. Ansuspension of a colloidal dual-valent rare earth hydroxide is especiallynuseful for polishing silica. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111065707-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019043819-A1 |
| priorityDate |
1998-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |