| abstract |
A positive resist composition, having a superiornresolution as well as good resist performances such asnsensitivity, depth of focus and profile, which comprises annovolac resin, a radiation-sensitive quinonediazide compoundnand a thioxanthone compound represented by the followingnformula (I):n nwherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 independently representnhydrogen, halogen, alkyl, alkoxy, aryl, carboxyl ornalkoxycarbonyl is provided. |