| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1374dd16777534b65ad4422333245af8 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L67-03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-4644
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2367-03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0079
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K2201-005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-161
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J5-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G63-183
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B27-08 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-46 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 |
| filingDate |
1997-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_36227063b9a17cde897ec84148793876
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6ae04d8ea62cee7d6f6beab9bac8f801
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_38339dac556e83e67d851a1e01b2a152
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fbc94fb349712035fcfb2b01e2d9d888
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7d813ee7f6126df4526e36f26f08ead6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_460dfba00fb310e0fce07f9f6a2c9cbd |
| publicationDate |
1999-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0961173-A1 |
| titleOfInvention |
Photoresist layer supporting film |
| abstract |
A photoresist layer supporting film (A) formed from a polymer composition comprising (i)n55 to 100 % by weight of a copolyester containing ethylene terephthalate units as a mainnrecurring unit and having a melting point of 210 to 250° and (ii) 0 to 45 % by weight ofnpolybutylene terephthalate or a copolyester containing butylene terephthalate units as anmain recurring unit and having a melting point of not lower than 180°C, (B) having a planenorientation coefficient of 0.08 to 0.16, and (C) having L5 values in the longitudinal andntransverse directions in the range of 1 to 65 g/mm, the L5 value being obtained in a tensilentest carried out on a 10 mm wide strip-like sample of film. n The photoresist layer supporting film is laminated to a photoresist layer and a protectivenfilm or a conductive substrate, in order to produce a photoresist film laminate. |
| priorityDate |
1996-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |