Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate |
1999-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f34bd0e05471b128d673919a0ca151a7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b65c891a265e8809f6764e422c14bf61 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc1064e818258926814023e4c9fd0dec http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_461e40ca35d26b50d6747a20c253f5d0 |
publicationDate |
1999-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-0959389-A1 |
titleOfInvention |
Diazodisulfone compound and radiation-sensitive resin composition |
abstract |
A novel diazodisulfone compound capable of generatingnacid having high sensitivity to far ultraviolet rays typifiednby a KrF excimer laser and the like and capable of providingna resist with superior resolution and patterns when used as anphotoacid generator for a chemically amplified resist, and anradiation-sensitive resin composition comprising thendiazodisulfone compound. The diazodisulfone compound isnrepresented by the following formulas (1) and (2).n nThe radiation-sensitive resin composition comprises thendiazodisulfone compound and resin represented by 4-hydroxystyrene/4-(1'-ethoxyethoxy)styrenencopolymer. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1059563-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/SG-90230-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6623907-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1122605-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0155789-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0155789-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1164434-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1164434-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1134617-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1134617-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6737213-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1099691-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1122605-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8771357-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100710104-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6586152-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6517992-B1 |
priorityDate |
1998-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |