| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_54d600ecc035c6e5261c9690dd1d6a67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38e4b503b1979a5d277324483132316a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76801 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31051
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02129
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0234
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31612
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3185 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-522
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-318
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 |
| filingDate |
1998-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b309a94c39a8c09b540b2828bf53e632
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3aa9aa7321e47cf19bc52022550ff65a |
| publicationDate |
2000-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0939433-A3 |
| titleOfInvention |
Method for reforming undercoating surface and method for production of semiconductor device |
| abstract |
This invention is directed to a method fornreforming an undercoating surface prior to the formation ofna prospective film by the CVD technique using a reactionngas containing an ozone-containing gas having ozonencontained in oxygen and TEOS. It effects the reform of thensurface by forming an undercoating insulating film 5 on ansubstrate prior to the formation of film and exposing thensurface of the undercoating insulating film 5 to plasmangas. |
| priorityDate |
1998-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |