http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0936283-A1

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filingDate 1998-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_730394e0bb7f69c1cd59fe4a87fa6a61
publicationDate 1999-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber EP-0936283-A1
titleOfInvention Barrier layer for packaging material and process for its manufacture
abstract The invention relates to a method for producing barrier layers (4) for gases and vapors on plastic substrates (2), in particular plastic films and molded articles. For this purpose, at least one barrier layer (4) is applied to the substrate (2) by means of a gas phase deposition process, which consists of an inorganic matrix consisting of an oxide, e.g. B. silicon, boron, aluminum, titanium or tin oxide, a nitride or oxynitride and a carbon portion or alternatively also has a portion of a metal. The barrier layer (4) is deposited on the plastic substrate (2) by means of a PCVD deposition process using a reactive gas containing the above substances and by supplying microwave energy. The layers (4) produced in this way have a high barrier action against the permeation of gases, in particular against hydrocarbons, oxygen, carbon dioxide and water vapor. The barrier layers (4) are used to manufacture thin-walled packaging, such as. B. films or for the production of container walls for z. B. CO 2 -containing soft drinks container used.
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