| abstract |
A radiation sensitive resist composition with highnsensitivity, capable of forming a highly heat-resistantnresist pattern. The radiation-sensitive resistncomposition contains, together with a resist material,na polymer which is obtained by reacting (a) a xylylenencompound, (b) salicylic acid and (c) 9,9'-bis(hydroxyphenyl)fluorenenderivatives or diolncompounds of 3,3,3',3'-tetramethyl-2,3,2',3'-tetrahydro-(1,1')-spirobiindene,nand which has a weightnaverage molecular weight of 1,000 to 5,000 and Tg of 100nto 150 °C . Examples of (c) include 9,9'-bis(4-hydroxyphenyl)fluorenenand 3,3,3',3'-tetramathyl-2,3,2',3'-tetrahydro-(1,1')-spirobiindene-6,6'-diol.nAs the resist material, any of positive- andnnegative-working resists may be used, with thatncomprising an alkali-soluble resin and a quinonediazidenphoto-sensitizer being preferably used. |