http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0922198-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b7317808024e524eea40a6c5a5ad6a22 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-41 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-17 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-1717 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-45 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-17 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N29-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01B9-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-00 |
| filingDate | 1998-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8060e719a73b9cea0cb2d63c1b10cff7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1af14edba5e4d4e9b49d3cadb4ac6814 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7423732d664e34ecc826f909665cdffd |
| publicationDate | 1999-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0922198-A1 |
| titleOfInvention | Method and device for measuring the concentration of ions implanted in semiconductor materials |
| abstract | A method and apparatus that determines a concentration of ions implanted in a material is described. The method includes the steps of: (1) passing an excitation pulse through a diffracting mask (e.g., a phase or amplitude mask) to generate at least two excitation laser sub-pulses; (2) irradiating a region of the material with a "grating" pattern, formed by overlapping two excitation laser sub-pulses in time and space to initiate a time-dependent response (e.g., a change in refractive index) in the region; (3) diffracting a probe laser pulse having a duration that is at least as long as the time-dependent response off the region to generate a time-dependent signal beam; (4) detecting the time-dependent signal beam to generate a signal waveform; and (5) processing the signal waveform to determine the concentration of ions implanted in the material. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8479778-B2 |
| priorityDate | 1997-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 32.