Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1374dd16777534b65ad4422333245af8 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S206-833 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-673 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-1352 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L67-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L77-12 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-673 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L67-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L77-12 |
filingDate |
1997-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2009-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed50006de0f841ff1fec15c608348534 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c2b760476fea0ba1d49eb07e7ee810ee http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a2e64247fd148dd6905ec6d0e46e8b0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1189d347f7f76f7e6a70fe45c65f7839 |
publicationDate |
2009-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-0915506-B1 |
titleOfInvention |
Silicon wafer carrier |
abstract |
A silicon wafer carrier having a composition comprising: (a) 100 parts by weight of a polyester; (b) 5 to 100 parts by weight of a polyether ester amide; (c) an alkali metal in an amount of 10 to 2500 ppm based on the polyether ester amide; and (d) 0 to 40 parts by weight of a modified polyolefin, wherein the amount of a volatile gas evolved upon heat treatment at 150 °C for 60 min is not more than 10 ppm, the amount of the alkali metal eluted upon immersion in pure water at 80 °C for 120 min is not more than 10 ppm. The amounts of the volatile gas evolved and the metal eluted can be suppressed to such an extent as will not substantially cause surface contamination of a silicon wafer, and the silicon wafer carrier has excellent permanent antistatic properties, high mechanical properties, and heat resistance. |
priorityDate |
1997-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |