| abstract |
A chemical amplifying type positive photoresistncomposition, excellent in various properties, particularlynin TDE resistance as well as sensitivity and resolution,nand able to suppress unfavorable halation effect withoutndeteriorating profile, which comprises (A) a resin whichnis converted to alkali-soluble from alkali-insoluble or onlynslightly alkali soluble by the action of an acid, (B) annacid generator, (C) a basic compound and (D) a fluorenonencompound represented by the following formula (I):n nwherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 and R 8 each independentlynrepresent hydrogen, alkyl having 1 to 6 carbon atoms whichnmay be optionally substituted with halogen, halogen or nitronis provided; and a precise fine photoresist pattern can benformed in high precision using the photoresist composition. |