| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0385
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-121
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-128 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
1998-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b289eaf101a7e3efed3d5e52a5afb898
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_955eefd3ff569a382f9208a334d47db0 |
| publicationDate |
1998-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0880075-A1 |
| titleOfInvention |
Radiation sensitive resin composition |
| abstract |
A radiation sensitive resin composition comprising (A)na fluorine-containing copolymer of hexafluoropropylene, atnleast one compound selected from the group consisting ofnunsaturated carboxylic acids and unsaturated carboxylicnanhydrides, and an unsaturated compound (B) an acidngenerating compound which generates an acid upon exposurento radiation; (C) a cross-linkable compound; and (D) annorganic solvent. The composition suitable is useful for annegative resist for forming a mask for the production of ancircuit such as a semiconductor integrated circuit or anthin film transistor circuit for liquid crystal displays asnwell as a material for forming a permanent film such as anninterlaminar insulating film or a color filter protectivenfilm. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-02077710-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6849377-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102460288-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6468712-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102460288-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1296186-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6593058-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0163362-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0163362-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7276323-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1126322-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006099380-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006099380-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015187413-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6858379-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6852476-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I394001-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-02077710-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10190015-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1126322-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6908724-B2 |
| priorityDate |
1997-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |