http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0876298-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d19f9f9747fbeb6c7cd405246ac82eb |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-285 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-28 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-28 |
| filingDate | 1996-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b767d06de7af93cae92147e6c0f6a8cc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7a5c6aced431f417b0f9186f1d3dea3e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8739b313c96fb2517b2cb438858bd244 |
| publicationDate | 1998-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0876298-A1 |
| titleOfInvention | Process for purifying rinsing water used in semiconductor manufacture |
| abstract | PCT No. PCT/CH96/00442 Sec. 371 Date Apr. 28, 1998 Sec. 102(e) Date Apr. 28, 1998 PCT Filed Dec. 17, 1996 PCT Pub. No. WO97/25278 PCT Pub. Date Jul. 17, 1997The hydrophilic organic contaminants and hydrogen peroxide present in semiconductor fabrication reclaims are removed by means of adsorption of a pyrolysate of a macroreticular sulphonated vinyl-aromatic polymer having a carbon content of at least 85% by weight and a carbon/hydrogen atomic ratio of from 1.5:1 to 20:1. In spite of their hydrophobic surface, the pyrolysates have a comparatively high adsorptivity for these contaminants and provide for distinctively higher removal rates than customary activated carbons. |
| priorityDate | 1996-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 34.