| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-12 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
1997-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2002-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e4900f5107982c3eaa801f05ac37a016
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dbedb1a5039de4a4d2212c916ad759ca
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e0873750b5ddc9495ae3ba37e6c13c1a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6068319f9279ed74d41db69dc719c517
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9770ede2c7568ae0bf849c7ad5b9ddab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_853861c0b322e06c4a82d380374b3c87 |
| publicationDate |
2002-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0848289-B1 |
| titleOfInvention |
Negative-working chemical sensitization photoresist composition |
| priorityDate |
1996-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |