http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0843841-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_daa48ed820a7dad29affa51e58caf757 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-426 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate | 1997-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_338f13122adf97f9a853900619614a1f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_80a48ca703171cf47602b60077f750fa http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_32f4f4660da33be749fc08505dabd545 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_993d79d9a97b158d3bda7b879cba1d3f |
| publicationDate | 1998-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | EP-0843841-A1 |
| titleOfInvention | Stripping composition |
| abstract | The invention relates to an agent for removing photoresist and to a method of removing photoresist. Said agent essentially comprises 20 to 50 wt.% of a primary alcoholamine and a solvent which contains 30 to 70 wt.% of an alkyleneglycolalkylether, as well as 70 to 30 wt.% of an organic sulphur-oxide compound, such as dimethylsulphoxide. It has been found that said agent can be used very effectively to strip away photoresist. Said effectiveness continues unabated even after a large number of substrates have been treated with this agent. |
| priorityDate | 1996-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 95.