| abstract |
The invention relates to a method for producing a highly porous anti-reflection coating, the coating produced by this method and compositions for carrying out the method. The process according to the invention is characterized in that a colloidally disperse solution which has been obtained by hydrolytic condensation of one or more silicon compounds of the general formula I, RaSiX4-a in which the radicals are identical or different and R is an organic radical with 1 to 10 carbon atoms, which can be interrupted by oxygen and / or sulfur atoms and / or by amino groups, X for hydrogen, halogen, hydroxy, alkoxy, acyloxy, alkylcarbonyl, alkoxycarbonyl or NR'2 is with R 'is hydrogen, alkyl or aryl and a is 0, 1 or 2, and / or precondensates derived therefrom, optionally in the presence of a solvent and / or a catalyst by the action of water or moisture, and which one or more Contains OH and / or NH groups containing organic polymers with an average molecular weight between 200 and 500,000 in colloidal solution, the molar ratio of polymer to silane is between 0.1 mmol / mol silane and 100 mmol / mol silane, applied to a substrate and dried, and that the organic components are removed by heating. The anti-reflection coating according to the invention is used to simultaneously increase the transmission and to prevent or minimize unwanted reflections of visible or other electromagnetic radiation. <IMAGE> |