| abstract |
The present invention provides new photoresist compositions that comprise a resinnbinder, a photoactive component, particularly an acid generator, and a dye material thatncontains one or more chromophores that can reduce undesired reflections of exposurenradiation. Preferred dye compounds are polymeric materials that include one or morenchromophores such as anthracene and other polycyclic moieties that effectively absorbndeep UV exposure radiation. |